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Topical Symposium
Topical Symposium
The 154th Topical Symposium of the Magnetic Society of Japan

Recent Progress on Fabrication of Nano-Structured Magnetic Materials
  Recently, there has been growing importance in fabrication and control of the nano-structure in magnetic materials. New challenges for the nano-structuring, in addition to the conventional film deposition and pattering processes, are starting especially in tunnel magnetoresistance (TMR) devices, current-perpendicular-to-the-plane giant magnetoresistance (CPP-GMR) devices and patterned magnetic recording media. In this topical symposium, we have invited active authorities and planned their lectures on recent progress in such fields. We very much look forward to your participation. Moreover, we will also welcome the continuing participation from the general meeting of the Magnetic Society of Japan.

Date: May 15, 2007 (Tuesday) 13:00-16:40
Venue: Surugadai Memorial Hall, Chuo Univ. Room 280
Kandasurugadai 3-11-5, Chiyoda, Tokyo
(3 mins. walk from Ochanomizu Station of JR or Shin-ochanomizu Station of Subway)
TEL: 03-3292-3111
In cooperation with: IEEE Magnetic Society Japan Chapter, Society of Nano Science and Technology, The Chemical Society of Japan, The Institute of Electrical Engineers of Japan, The Institute of Electronics, Information and Communication Engineers, The Japan Institute of Metals, The Japan Society of Applied Physics, The Physical Society of Japan, The Surface Science Society of Japan.
Admission fee: Free (reserved reader and student)
2,000 Yen (member and corporate member)
4,000Yen (non-member)
Textbook: 1,000 Yen (member, corporate member, non-member and student)
Further information: please contact The Magnetics Society of Japan.
TEL. 03-5281-0106
URL: http://www.wdc-jp.com/msj/intro/office.html
Organizers: H. Akinaga (AIST), H. Nakamura (Shin-Etsu Chemical), T. Suzuki (AIT)
 
Program:
 
Chairperson: H. Akinaga (AIST)
13:00-13:40 “3D Nanostracuture Fabrication and Nanoimprint Technology”
   S. Matsui (Univ. of Hyogo)
13:40-14:20 “Nanofabrication Based on Highly Ordered Alumina Nanohole Arrays”
   H. Masuda (Tokyo Metropolitan Univ./KAST)
Coffee Break 14:20-14:40
Chairperson: T. Suzuki (AIT)
14:40-15:20 “Damage-Free and Anisotropic Etching of Magnetic Films Using Pulse-Time-Modulated Plasma”
   S. Samukawa (Tohoku Univ.)
15:20-16:00 “Fabrication of Deep-Submicron-Size Tunnel Junctions Using Supercritical CO2 Lift-Off Process”
   A. Fukushima, H. Kubota, S. Yuasa (AIST)
16:00-16:40 “Control of Electrical and Magnetic Properties of Magnetic Nanostructures by AFM Lithography”
   Y. Takemura1), J. Shirakashi2)
(1)Yokohama National Univ., 2)Tokyo Univ. of Agriculture and Technology)

*Audio and/or visual recording is prohibited.